Patterned Sapphire Substrate (DPSS)

DPSS (Dry‑etched Patterned Sapphire Substrate) is a technology for fabricating micro‑nano patterns on sapphire surfaces via plasma dry‑etching process.The typical process flow is as follows: photoresist is coated on the sapphire substrate, and patterns are defined by photolithography. Equipment such as Inductively Coupled Plasma (ICP) is then adopted to transfer patterns onto sapphire through reactive‑ion bombardment, followed by removal of residual photoresist.

It delivers outstanding controllability over pattern shape, dimension and period. Structures such as cones with high aspect‑ratio can be fabricated with excellent pattern uniformity and repeatability, which helps improve the crystal quality of LED epitaxy and light‑extraction efficiency.Widely applied in scenarios demanding high luminous efficiency and wavelength uniformity, such as high‑end lighting and display backlighting, DPSS stands as one of the mainstream solutions for high‑end PSS.